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CB45000 SERIES
HCMOS6 STANDARD CELLS
FEATURES
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0.35 micron 5 layer metal HCMOS6 process, retrograde well technology, low resistance salicided active areas and polysilicide gates. 3.3 V optimized transistor with 5 V I/O interface capability 2 - input NAND delay of 160 ps (typ) with fanout = 2. Broad I/O functionality including Low Voltage CMOS, Low Voltage TTL and LVDS. Driving capability to ISA, EISA, PCI, MCA, and SCSI interface levels High drive I/O; capability of sinking up to 24 mA with slew rate control, current spike suppression and impedance matching. Generators to support Single Port RAM, Dual Port RAM, and ROM with BIST options. DRAM integration in ASIC methodology Extensive embedded function library including ST DSP and micro cores, third party micros and Synopsys synthetic libraries. Fully independent power and ground configurations for inputs, core and outputs. I/O ring capability up to 1000 pads. Latchup trigger current > +/- 500 mA. ESD protection > +/- 4000 volts typical value
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Oscillators for wide frequency spectrum. Broad range of 500+ SSI cells Design For Test features including IEEE 1149.1 JTAG Boundary Scan architecture. Cadence, Mentor and Synopsys based design systems with interfaces from multiple workstations. Broad ceramic and plastic package range.
CB45000 Super-Integration Cost Effective Product Architecture Partitioning s Trouble free integration s Application Specific
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ROM
DSP
DPRAM
ST20
Your Product is Unique s User specified cell integration s Design Confidentiality s IP fully re-usable
March 1998
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GENERAL DESCRIPTION The CB45000 standard cell series uses a high performance, low voltage, 5 level metal, HCMOS6 0.35 micron process to achieve subnanosecond internal speeds while offering very low power dissipation and high noise immunity. With an average routed logic density of 14000 gates/mm2, the CB45000 family allows the design of highly complex devices. The potential available gate count ranges above 3 Million equivalent gates. Devices can operate over a Vdd voltage range of 2.7 to 3.6 volts. The I/O count for this array family ranges to over 750 signals and 1000 pins based upon the package technology utilized. A flexible I/O approach has been developed to provide an Figure 1 Process Overview optimum solution for today's complex system problems of drive levels and specialized interface standards. The product offers a variable bonding approach supporting pad spacings from 80 upwards and supports staggered pad rows to address today's bonding technologies. Additional flexibility to support 65 and 50 pad spacing will be available in the near future. The I/O can be configured for circuits ranging from low voltage CMOS and TTL to low swing differential circuits (LVDS) and the 1Gigabit per second high speed link. Standards like SCSI, 3.3 and 5 Volt PCI and other 5.0 Volt interfaces are currently being addressed.
Metal 5 : Al-Cu
Metal 4 : Al-Cu
Metal 3 : Al-Cu
Metal 2 : Al-Cu
Metal 1 : W
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TECHNOLOGY OVERVIEW A major feature of the HCMOS6 process is salicided active areas. This results in source drain areas that are on the order of one to two ohms resistance as opposed to the hundreds or thousands of ohms of source drain resistance in non-salicided technologies. This very low resistance is one reason that very low transistor widths could be utilized in the cell design since drive is not lost due to source drain resistance. This use of low width transistors results in lower capacitance loading of the gates due to the smaller areas utilized. Low resistance, low capacitance, and small gates results in low power usage for inverters as compared to previous technologies. The reduction in power consumption allows the usage of salicided active stripes to distribute power internally to the simple cell, replacing, in some cases, the usage of the first metal layer. This saves silicon area by allowing greater density, permeability and routability of the cells resulting in greater overall circuit density. The other major feature of the HCMOS6 process is five metal layer interconnect using CMP (Chemical Mechanical Polishing) planarization. The use of CMP for improved planarity between metal layers allows the use of additional interconnect layers without yield degradation, improving density whilst retaining low costs. The power distribution methodology provides separate internal distributions to improve product noise margin and reduce power loss. The three supplies are: s Internal Vdd and Vss Serves the core cells and the prebuffer sections of the I/O s External Vdd and Vss Serves the output transistors only s Receiver Vdd and Vss Serves the first stages of the receiver cells. Optional distributions for 5.0V interface and other standards can be utilized as necessary.
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LIBRARY The CB45000 Series library is organized into four categories: s SSI cell library s IO Cell library s Macrofunctions s Module generators SSI CELL LIBRARY OVERVIEW The design of the CB45000 family has been optimized to allow extremely high density, high speed and low power designs. For these reasons a wide range of cells with different ranges of driving capability are available in the library. The library cells have been optimized in term of functional and electrical parameters in order to have: s Good balancing s Maximum speed s Optimum Threshold voltage Symmetric Vdd/Vss Noise margin Minimum Power-Speed figure The geometrical aspect of the cells was configured to allow extremely dense design, fully exploiting the features of the Place and Route tool in terms of horizontal and vertical routing grids. For Place and Route, up to five levels of metal are utilized. Intracell wiring is limited as far as possible to first metal, with second, third and fourth metal levels dedicated to interconnect wiring and power distribution. The fifth metal is used for power and clock bussing.
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CORE LOGIC The propagation delays shown in the CB45000 data book are given for nominal processing, 3.3V operation, and 25 C temperature conditions. However there are additional factors that affect the delay characteristics of the macrocells. These include loading due to fanout and interconnect routing, voltage supply, junction temperature of the device, processing tolerance and input signal transition time. Prior to physical layout, the design system can estimate the delays associated with any critical path. The impact of the placement and routing can be accurately RC back annotated from the layout for final simulations of critical timing. The effects of junction temperature, (KT) and voltage supply (KV) on the delay numbers are summarized in Table 2 and Table 2. A third factor, is associated with process variation. This multiplier has a minimum of 0.8 and a maximum of 1.2. Table 1 Junction Temperature Multipliers Temperature oC -55 -40 25 70 85 125 KT 0.77 0.83 1.00 1.13 1.17 1.27
10 Em
Figure 2. ND2 Core Cell
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Table 2 Voltage Multipliers VDD 2.7 3.0 3.3 3.6 KV 1.20 1.11 1.00 0.94 set of I/O transistor subcells. These subcells can be quickly configured using metallization layers to conform to a variety of I/O specifications whilst maintaining optimal ESD protection levels and latch-up prevention characteristics. The I/O circuitry also includes subcells of specialized transistors that are used to form the slew rate control sections of each I/O line. Current spike suppression logic ensures that conducting transistors are turned off before the opposing set are turned on. The bond pad itself is variable in terms of pitch and size and even supports staggered bonding methodologies. This is becoming far more
I/O BUFFER LIBRARY The CB45000 does not use traditional I/O cell design; SGS-THOMSON was one of the pioneers of the emerging "Flexible I/O" approach and the CB45000 features variable bonding and a flexible output transistor scheme based on a predefined Figure 3 Flexible IO Buffer Technology
EDGE OF DIE GUARDRING
Programmable pad locations allows one IO cell library to be used for both staggered and linear bonding.
EDGE OF DIE GUARDRING
ESD CLAMP STRUCTURES
ESD CLAMP STRUCTURES
ESD CLAMP STRUCTURES
ESD CLAMP STRUCTURES
ESD CLAMP STRUCTURES
ESD CLAMP STRUCTURES
OUTPUT DRIVE TRANSISTORS
OUTPUT DRIVE TRANSISTORS
OUTPUT DRIVE TRANSISTORS
OUTPUT DRIVE TRANSISTORS
OUTPUT DRIVE TRANSISTORS
OUTPUT DRIVE TRANSISTORS
DIODES LOGIC CIRCUITS TEST INTERFACE SLEW CONTROL
DIODES LOGIC CIRCUITS TEST INTERFACE SLEW CONTROL
DIODES LOGIC CIRCUITS TEST INTERFACE SLEW CONTROL
DIODES LOGIC CIRCUITS TEST INTERFACE SLEW CONTROL
DIODES LOGIC CIRCUITS TEST INTERFACE SLEW CONTROL
DIODES LOGIC CIRCUITS TEST INTERFACE SLEW CONTROL
DIE CORE
DIE CORE
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important as the packaging options become ever broader. The pad size and pitch are not determined until the customers choice of packaging, signal interface standards and I/O count is considered. Wire bond pad spacings down to 65 and 50 centres will released in the near future to support large signal counts without die area loss. All pads except the sixteen corner pads can be configured as power or I/O pads. The configured power pads are known as placeable pads and have an associated current handling capability. Their placement is dependent on the types of output buffers used in the design. For rules governing the placement of pads, please contact your local SGS-THOMSON design centre. I/O TEST INTERFACE The IO cells have a dedicated test interface to facilitate parametric and Iddq testing of devices. This test interface connects standard core signals or dedicated test signals to the IO cells allowing all Output Buffers to be driven high, low or put into tristate regardless of the state of the internal logic. This greatly simplifies parametric testing of the part and also assisting customers who wish to use this feature during board testing. Note that all output buffers can be tristated by this function including buffers that normally do not tristate. This test function also turns off all pull up or down devices and shuts down all differential receivers and converts them into standard CMOS receivers. This allows Iddq test methodologies to be employed in a very efficient way, avoiding unneeded circuit overhead. Inside the IO cell is a section of specialized transistors used to create the receiver functions. A full set of standard receivers with pull up and pull down devices is present in the library. The technologies supported match the output buffer capabilities and include, LVCMOS, LVTTL, GTL, CTL, Differential, etc. and a five volt interface capability.
Table 3
I/O Drive Capacity for LVCMOS and LVTTL Slew Rate Buffers Maximum Capacitance (pF) 50 100 200 300 400
Current Drive (mA) 2.0 4.0 8.0 12.0 16.0
MACROCELLS AND MACROFUNCTIONS The CB45000 series has internal macrocells that are robust in variety and performance. The cell selection has been driven by the need of Synthesis and HDL based design techniques. This offering is rich in buffers, complex combinatorial cells and multi power drive cells, which allow the Synthesis tool to create a netlist compatible with the requirements of Place and Route tools. Macrofunctions are a series of soft-macros facilitating quick capture of large functional blocks and are available for such functions as counters, shift register and adders. Macrofunctions are implemented at layout by utilizing macrocells and interconnecting to create the logic function.
Table 4
I/O Drive Capacity for LVCMOS and LVTTL Non Slew Rate Buffers Maximum Capacitance (pF) 50 100 200 300 400
Current Drive (mA) 2.0 4.0 8.0 12.0 16.0
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Table 5 Module Generator Library Description 256K bits max 16K word max 128 bit max Zero static current, Tristate outputs 256K bits max 16K word max 128 bit max Zero static current, Tristate outputs 2M bits max 32K word max 64 bit max Diffusion programmable, Tristate outputs
Cell SPRAM
DPRAM
ROM
MODULE GENERATORS A series of module generators using compiled cell generation techniques, are available to support a range of megacells. These modules enable the designer to choose individual parameters in order to create a compiled cell, which meets the specific application requirements. These include single port RAM, dual port RAM and ROM. The compiled cell generators construct custom cells, which are implemented using a special leaf cell technique, ensuring predictable layout and accurate module characteristics. In choosing megacells the designer can consider the tradeoffs between speed and area to generate a fully customized cell which meets their specific device requirements. MEGACELLS These megacell generators are complemented by a group of application specific embedded megacells. These allow access to technologies that have been hitherto the domain of standard products. Examples include mixed mode cells for graphics, DAC/ADC's (4-9 bit), PLL applications, and Digital Signal Processor functions for cellular comms, fax and high-speed modems, which initially consist of a Triple 8-bit DAC, Graphics RAM, Clock Multiplier PLL and Frequency Synthesis PLL. 100 Mbps serial transputer links coupled with large and fast memory can be used for pipelining, caching and synchro circuits in modern RISC computing architectures. Viterbi and Reed Solomon cores aim at the HDTV and satellite transmission markets. To support telecom needs for CCITT standard applications, ADPCM cells supporting CT2 protocol have been developed. DESIGN FOR TESTABILITY The time and cost for ASIC testing increases exponentially as the complexity and size of the ASIC grows. Using a design for testability methodology allows large, more complex ASICs to be efficiently and economically tested. CB45000 supports the JTAG boundary Scan and both edge and level sensitive scan design techniques by providing the necessary macrocells. Scan testing aids device testability by permitting access to internal nodes without requiring a separate external connection for each node accessed. Testability is assured at device level with the close coupling of LSSD latch elements, Automatic Test Pattern Generation (ATPG) and high pattern depth tester architecture. BIST options for memory generators are also available. At system level, SGS-THOMSON fully supports IEEE 1149.1, and the I/O structure utilized in this family is completely compatible. Several types of core scan cells are provided in the CB45000 Series library. Examples include FDxS/FJKxS cells which are edge sensitive and LSxx cells
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which are true LSSD cells. Non-overlapping clock generator macros are also available. For parametric and Iddq testing, the I/O cells contain a dedicated test interface as described previously (See "I/O TEST INTERFACE" on page 6.) EVALUATION DEVICE An evaluation device is used to demonstrate the performance of the CB45000 series as well as verify the effectiveness of the design system. The device has path delays, latches and a set of macrocells and memory functions which were used to verify the simulated characteristics that are supplied in the data book. Characterization of the path delays including interconnect shows typical delays of 160 ps for a 2 input NAND with receivers/drivers operating at frequencies of 200 MHz. The evaluation device is available in a 208 pin plastic quad flat pack.
Figure 5 Evaluation Device Cross Section
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PACKAGE AVAILABILITY The CB45000 Series is designed to be compatible with QFP, BGA and SBC package types, in addition to the more traditional types found. The options include Plastic Leaded Chip Carriers (PLCC) up to 84 pins, while the Metric Quad Flat Pack (xQFP) offering ranges up to 208 pins. Both high performance and high power variants are available as well as the TQFP thin types. Ball Grid Array (BGA) packages are available from 160 to 500 pins with further developments planned in the near future. SBC types allow the pin count to reach the area of 1000 pins. The diversity in pin count and package style gives the designer the opportunity to find the best compromise for system size, cost and performance requirements.
Figure 6 Packaging Capability NUMBER OF LEADS (Pins) 20 28 44 64 68 80 84 100 120 128 144 160 176 180 208 224 225 256 257 304 352 400 480 r A Packages in Production Packages in Development
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PQFP
TQFP
PACKAGE NAME BGA PLCC r
POWER PQFP Slug/Spreader
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A A A
CB45000 SERIES
DESIGN ENVIRONMENT Several interface levels are possible between SGS-THOMSON and the customer in the undertaking of an ASIC design. The four levels of interface are shown in Figure 7. Level 1 is characterized by SGS-THOMSON receiving the system specification and taking the design through to validation and fabrication. At level 2 interface the designer supplies a complete logic design implemented in a standard generic logic family. SGS-THOMSON then takes the design through to layout, validation and fabrication. Level 3 is the most common and preferred interface level. Logic capture and pre-layout simulation are performed by the designer using an SGS-THOMSON supported design kit. The design is then taken through layout, validation and fabrication by SGS-THOMSON. The SGS-THOMSON design system validates all designs before fabrication. Design kits are provided that allow schematic capture entry via Mentor Graphics and Cadence products. Simulation is supported for Cadence and Mentor Graphics. Full support is also provided for Cadence Verilog, Synopsys VSS and System Hilo simulators. Figure 8 shows the SGSTHOMSON Design Flow. Test vector development uses TSSI software from Summit and Currentest from CrossCheck.
Figure 7 Customer / SGS-THOMSON Interface Levels
SYSTEM
SYSTEM SPECIFICATION
LOGIC DESIGN
SCHEMATIC CAPTURE
DESIGN VERIFICATION
PRE-LAYOUT SIMULATION
LAYOUT
POST-LAYOUT MANUFACTURE SIMULATION AND TEST
CUSTOMER
SGS-THOMSON
INTERFACE LEVELS
LEVEL 1
CUSTOMER LEVEL 2
SGS-THOMSON
CUSTOMER LEVEL 3
SGS-THOMSON
CUSTOMER
SGS-THOMSON
CUSTOMER LEVEL 4
SGS-THOMSON
ECR1
ECR2
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CB45000 SERIES
Figure 8 SGS-THOMSON Layout Driven Design Flow
HARDWARE DESCRIPTION LANGUAGE VHDL / VERILOG
FUNCTIONAL SIMULATION VHDL / VERILOG
GATE LEVEL SIMULATION VERILOG / MENTOR TIMING ANALYSIS FORMAL PROOF
FLOORPLANNING IPO / ECO
LOGIC SYNTHESIS SCAN INSERTION
SCHEMATIC CAPTURE CADENCE MENTOR
DELAY EVALUATION RC BACK-ANNOTATION
ACCELERATION HW / SW EMULATION
POWER ESTIMATION POWER ANALYSIS
FAULT ANALYSIS TSSI / IDDQ
CLOCK TREE SYNTHESIS
LAYOUT
SILICON
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Table 6 Absolute Maximum Ratings (note1)
-0.5 V to + 4.6 V -0.5 V to (Vdd + 0.5V) -0.5 V to +6.0 V -24mA source, +24mA sink -65 to 150 degrees Centigrade -40 to 125 degrees Centigrade
Supply Voltage, Vdd Input or Output Voltage 5 Volt Tolerant Input or Output Voltage DC Forward Bias Current, Input or Output Storage Temperature Ceramic Storage Temperature Plastic
ote 1.
Note 2.
Referenced to Vss. Stresses above those listed under "absolute Maximum Ratings" may cause permanent damage to the device. This is a stress rating only and functional operation of the device at these or any other conditions above those indicated in the operation sections of this specification is not implied. Exposure to absolute maximum rating conditions for extended periods may affect the device reliability. A dedicated 5V extra power supply is needed in case of PCI buffer usage in order to clip the incoming signal on PCI pads to the 5 Volt tolerant specified Absolute Maximum Rating (5V + Vbe value)R.
Table 7
Recommended DC Operating Conditions
3.3 V +/- 10% (3.0 V to 3.6 V) 3.3 V + 0.3V/-0.6V (2.7V to 3.6V)
Normal Operating Supply Voltage Vdd (note 1) Extended Operating Supply Voltage Vdd (notes 1,2) Operating Ambient Temperature Commercial (note 3) Industrial (note 3) Military (note 4)
Note 1. Note 2. Note 3. Note 4.
0 to 70 degrees Centigrade -40 to +85 degrees Centigrade -55 to +125 degrees Centigrade
Commercial, Industrial, and Military Conditions Low Voltage TTL Circuits are NOT functional to specifications below 3.0 Volts All circuits will operate to full specifications with a Vdd of 3.0V to 3.6V and a junction temperature of -40 to +125 degrees centigrade. These junction temperatures are compatible with the Commercial and Industrial Temperature Ranges. All circuits will be functional from -55 to +150 degrees centigrade junction temperature (military Ambient Temperature Range) but will not necessary operate to published specifications. Only circuits specified as operational to extended temperature range may be used when operating to Military temperature conditions.
Table 8
Symbol Iil Iih Ioz Cin Co Cio Iklu Vesd
Note 1. Note 2. Note 3. Note 4. Note 5.
General Interface DC Electrical Characteristics (Note 1)
Parameter Low Level Input Current High Level Input Current Tri-State Output Leakage Input Capacitance Output Capacitance Bidi, I/O Capacitance I/O Latch Up Current Electrostatic Protection Conditions Vi =Vss Vi = Vdd Vo=0V or Vdd Freq=1MHz Freq=1MHz Freq=1MHz VVdd HBM 200 2000 2.5 4.0 5..0 500 Min Typ Max +/-10 +/-10 +/-10 4.0 5.5 6.5 Unit uA uA uA pF pF pF mA V 5 Notes 2 2 2 3,4 3,4 3,4
These are extended voltage and temperature specifications Vdd from 2.7 V to 3.6 V ; Temperature Ambient from -55 to 125 degrees Centigrade Adherence to rules in Power Pin / Pad Specifications Required Excluding Package At 0.0 Volts Human Body Model
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Table 9
Symbol Vil Vih Vol Voh
LVTTL Interface DC Electrical Characteristics (Note 1)
Parameter Low Level Input Voltage High Level Input Voltage Low Level Output Voltage High Level Output Voltage Iol = Rated Buffer Current Ioh = Rated Buffer Current 2.4 2.0 0.2 3.0 0.4 Conditions Min Typ Max 0.8 Unit Volts Volts Volts Volts Notes 2,3 2,3 2,3,4 2,3,4
Vt + Vt Note 1.
Schmitt Trigger +Ve Threshold Schmitt Trigger -Ve Threshold 0.9
1.7 1.1
1.9
Volts Volts
2,3 2,3
Note 2. Note 3. Note 4.
These are normal Voltage and extended temperature specifications Vdd from 3.0 V to 3.6 V Temperature Ambient from -55 to 125 degrees Centigrade Adherence to rules in Power Pin / Pad Specifications Required Refer to the CB45000 Standard Cell Specification for full Testing Levels and Conditions Buffers offered in 2, 4, 8 mA TTL options (12, 16 and 24 mA available on request)
Table 10 LVCMOS Interface DC Electrical Characteristics (Note 1)
Symbol Vil Vih Vol Parameter Low Level Input Voltage High Level Input Voltage Low Level Output Voltage Iol = Rated Buffer Current Ioh = Rated Buffer Current 0.85 x Vdd 0.8 x Vdd 0.2 0.4 Conditions Min Typ Max 0.2xVdd Unit Volts Volts Volts Notes 2,3,4 2,3,4 2,3,4,5,6
Voh
High Level Output Voltage
0.9 x Vdd 1.7 1.9
Volts
2,3,4,5,6
Vt + Vt -
Schmitt Trigger +Ve Threshold Schmitt Trigger -Ve Threshold 0.9
Volts Volts
2,3 2,3
1.1
Note 1.
Note 2. Note 3. Note 4. Note 5.
Note 6.
These are extended voltage and temperature specifications Vdd from 2.7 V to 3.6 V Temperature Ambient from -55 to 125 degrees Centigrade Adherence to rules in Power Pin / Pad Specifications Required Refer to the CB45000 Standard Cell Specification for full Testing Levels and Conditions Buffers offered in 2, 4, and 8 mA CMOS options Note only one CMOS buffer may sink or source DC current when parametric measurements are taken due to the reason that the power supply specifications for CMOS product are not written to support DC current. If more than one buffer is active voltage drops in the supply may cause false failure readings. If no buffers are sinking or sourcing current and all internal pull up or pull down resistors in bidi buffers have been disabled by having the T2 Test Pin positive Vol (max) = 0.05 Volts and Voh (min)=Vdd-0.05 Volts
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Table 11 Five Volt Tolerant Interface DC Electrical Characteristics (Note 1,2)
Symbol Vil Vih Vol Voh Parameter Low Level Input Voltage High Level Input Voltage Low Level Output Voltage High Level Output Voltage Iol = Rated Buffer Current Ioh = Rated Buffer Current Vt + Vt Note 1.
Conditions
Min
Typ
Max 0.8
Unit Volts Volts
Notes 3,4 3,4 3,4,5 3,4,5
2.0 0.2 2.4 3.0 0.4
Volts Volts
Schmitt Trigger +Ve Threshold Schmitt Trigger -Ve Threshold 0.9
1.7 1.1
1.9
Volts Volts
3,4 3,4
Note 2.
Note 3. Note 4.
Five Volt Tolerant Inputs: receivers allowed to receive a 5V signal while being supplied at 3.3V Five Volt Tolerant Output: drivers allowed to drive external loads between 0V and 3.3V while being supplied at 3.3V having the ability to sustain 5V signals when tristated. These are normal Voltage and extended temperature specifications TTL specification only; Vdd from 3.0 V to 3.6 V Temperature Ambient from -55 to 125 degrees Centigrade Adherence to rules in Power Pin / Pad Specifications Required Refer to the CB45000 Standard Cell Specification for full Testing Levels and Conditions
Note 5. Buffers offered in 3, 4, 6, 8 mA TTL options
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DESIGN CENTRES
USA Carrollton, TX 75006-5039 1310 Electronics Drive MS 2337 Tel.: (1) 972/466-8844 Lincoln, MA 01773 55 Old Bedford Rd. Tel.: (1) 617/258-0300 San Jose, CA 95110 2055 Gateway Place Suite 300 Tel.: (1) 408/452-8585
EUROPE FRANCE 94253 Gentilly Cedex 7, avenue Gallieni - BP 93 Tel.: (33-1) 47407575 GERMANY 8011 Grasbrunn Bretonischer Ring 4 Neukeferloh Technopark Tel.: (49-89) 460060 ITALY 20090 Assago (MI) Viale Milanofiori Strade 4 - Palazzo A/4/A Tel.: (39-2) 89213215 40033 Casalecchio di Reno (BO) Via R. Fucini, 12 Tel.: (39-51) 591914 SWEDEN S-16421 Kista Borgarfjordsgatan, 13 Box 1094 Tel.: (46-8) 7939220 UNITED KINGDOM and EIRE Marlow, Bucks SL7 1YL Planar House, Parkway Globe Park Tel.: (44-1628) 890800
ASIA/PACIFIC HONG KONG Wanchai 22nd Floor Hopewell Centre 183 Queen's Road East Tel.: (852-5) 8615788 KOREA Seoul 121 8th floor Shinwon Building 823-14, Kuksman-Dong Kang-Nam-Gu Tel.: (82-2) 553-0399 SINGAPORE Singapore 2056 28 Ang Mo Kio Industrial Park 2 Tel.: (65) 482-1411
Information furnished is believed to be accurate and reliable. However, SGS-THOMSON Microelectronics assumes no responsibility for the consequences of use of such information nor for any infringements of patents or other rights of third parties which may result from its use. No license is granted by implication or otherwise under any patent or patent rights of SGS-THOMSON Microelectronics. Specifications mentioned in this publication are subject to change without notice. This publication supersedes and replaces all information previously supplied. SGS-THOMSON Microelectronics products are not authorized for use as critical components in life support devices or systems without express written approval of SGS-THOMSON Microelectronics. (c) 1996 SGS-THOMSON Microelectronics - All rights reserved SGS-THOMSON Microelectronics GROUP OF COMPANIES Australia - Brazil - France - Germany - Hong Kong - Italy - Japan - Korea - Malaysia - Malta - Morocco - The Netherlands - Singapore - Spain - Sweden - Switzerland - Taiwan - United Kingdom - U.S.A.


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